Title:
SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JP3294166
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To uniformly and efficiently form dielectric coating on a large-sized substrate.
SOLUTION: Plural targets 12 arranged in a vacuum chamber are respectively provided with target electrodes 13. In each target electrode 13, high frequency electric current intermittently outputted from a high frequency power source 26 is caused to flow via an impedance matching circuit 25c in a matching box 25 arranged adjacently to the vacuum chamber, and furthermore, d.c. electric current intermittently outputted from a d.c. power source 27 is superimposed on the high frequency electric current. The inside of the matching box 25 is provided with a switch unit 25a intermittently outputting the d.c. electric current intermittently outputted from the d.c. power source 27 synchronously to the outputting timing from the d.c. power source 27.
Inventors:
Keiji Yamada
Application Number:
JP25671997A
Publication Date:
June 24, 2002
Filing Date:
September 22, 1997
Export Citation:
Assignee:
Sanyo Vacuum Industry Co., Ltd.
International Classes:
C23C14/34; (IPC1-7): C23C14/34
Domestic Patent References:
| JP7258845A | ||||
| JP466665A | ||||
| JP10204636A |
Attorney, Agent or Firm:
Yoshiro Kurauchi