To provide a sputtering target capable of attaining high-quality film formation with high productivity by reducing contamination and abnormal electrical discharge due to nodule.

A rotary cylindrical sputtering target (20) includes a plurality of target pieces (22a, 22b) bonded to the periphery of a backing tube (60) while leaving a gap (52a) each between the adjacent target pieces (22a, 22b) in the axial direction. The gap (52a) has a straight section (95) which extends from the outer periphery of the target pieces (22a, 22b) toward the backing tube (60), and a tapered section (94) which is positioned between the straight section (95) and the backing tube (60) with an inclination (θ) in the longitudinal direction of the straight section (95).