To manufacture a homogeneous sputtering target free from defects such as blow holes attributable to casting.
High frequency melting is performed while blowing inert gas such as Ar gas or hydrogen flame as primary melting, the obtained molten metal is sufficiently stirred by a carbon rod, a ceramics rod (zirconia, alumina, magnesia or the like), and an ingot is obtained by solidifying the molten metal in a crucible or by casting it in a mold, and the thus obtained ingot or an ingot manufactured by the arc melting method is subjected to the high frequency melting, medium frequency melting, levitation melting, or cold crucible type vacuum melting in vacuum or Ar gas as the secondary melting. In performing the casting, a mold having an pouring basin part having a height of ≥ 50 mm and an area of ≥ 300 mm2 above the ingot is used.
HASEGAWA KOICHI
KAWASE MIKA
| JP2003313659A | 2003-11-06 | |||
| JP2004253618A | 2004-09-09 | |||
| JP2003311376A | 2003-11-05 | |||
| JP2002069625A | 2002-03-08 | |||
| JP2001101645A | 2001-04-13 | |||
| JP2001214868A | 2001-08-10 | |||
| JPH08134567A | 1996-05-28 | |||
| JPH08321415A | 1996-12-03 |