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Title:
スパッタリングターゲット、光情報記録媒体用薄膜及びその製造方法
Document Type and Number:
Japanese Patent JP4965540
Kind Code:
B2
Abstract:
A sputtering target is provided that has a relative density of 80% or more and contains a compound having as its principal component zinc oxide satisfying AXBYO(KaX+KbY)/2(ZnO)m, 1

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Inventors:
Hideo Hosono
Ueda Kamo
Masataka Yahagi
Hideo Takami
Application Number:
JP2008258076A
Publication Date:
July 04, 2012
Filing Date:
October 03, 2008
Export Citation:
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Assignee:
jx Nippon Mining & Metals Co., Ltd.
International Classes:
C23C14/34; C04B35/453; C23C14/08; G11B7/24; G11B7/243; G11B7/2433; G11B7/254; G11B7/257; G11B7/2578; G11B7/26
Domestic Patent References:
JP10063429A
JP2000195101A
JP6234565A
JP2003041362A
JP7333438A
JP11322413A
JP10060631A
JP10182150A
Attorney, Agent or Firm:
Isamu Ogoshi



 
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