Title:
STRIPPING METHOD
Document Type and Number:
Japanese Patent JP2001324823
Kind Code:
A
Abstract:
To provide a composition useful to remove antireflective compositions from a substrate and a method for removing the antireflective compositions from the substrate using the provided composition.
A stripping composition containing a polar aprotic solvent such as dimethyl sulfoxide or sulfolane and an aggressive base such as hydroxylamine or hydroxylamine formate is brought into contact with an antireflection composition applied to a substrate for a period of time sufficient for removal to remove the antireflective composition from the substrate.
Inventors:
SAHBARI JAVAD J
RUTTER EDWARD W JR
CALVERT JEFFREY M
RUTTER EDWARD W JR
CALVERT JEFFREY M
Application Number:
JP2001048854A
Publication Date:
November 22, 2001
Filing Date:
February 23, 2001
Export Citation:
Assignee:
SHIPLEY CO LLC
International Classes:
G03F7/11; B05D3/00; B05D7/00; C09D9/00; G03F7/42; H01L21/027; H01L21/30; (IPC1-7): G03F7/42; B05D3/00; B05D7/00; C09D9/00; G03F7/11; H01L21/027
Attorney, Agent or Firm:
Minoru Senda (2 outside)