To enable the doping of a formed material by vapor deposition, by holding a solid material between a pair of porous plates within an enclosure, sublimating the solid material by heating and taking out the material with a carrier gas.

The solid material to be sublimated is packed between the two porous plates 13 in an inert gaseous atmosphere within the enclosure 10. The solid material is heated and sublimated by a heating means 14 and the carrier gas is introduced into the enclosure 10 via a flow meter 12 from a carrier gas supply source 11. The sublimated vapor phase is taken out by the carrier gas via a pipe 17 and a valve 15. At this time, the heat exchange between the carrier gas and the solid material is optimized by the porosity of the porous plates 13 and the problem of the pyrolysis induced in the conventional sublimating device may be averted. The doping of the formed material by vapor deposition is made possible.