Title:
SUBSTRATE CLEANER
Document Type and Number:
Japanese Patent JP3442218
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate cleaner capable of favorably performing the cleaning of a substrate using chemical liquid.
SOLUTION: In a substrate cleaner in which a detergent is supplied from 3 nozzle 5(5a) to a substrate and the substrate is cleaned by a sheet-fed processing, a liquid preparation unit 6 provided with a weighing part 11 for weighing respectively two types or more of liquid (chemical liquid, pure water or the like); a preparation part 12 for preparing (mixing) each liquid weighed; and a storage part 13 for storing a detergent prepared in the preparation part 12 is arranged in the substrate cleaner, and the detergent (a detergent made by preparing two types or more of liquid) stored in the storage part 13 at a timing of cleaning the substrate of the device is supplied from the nozzle 5(5a) onto the substrate to clean the substrate in this structure.
Inventors:
Akihiko Morita
Masami Ohtani
Nobuyasu Hiraoka
Masami Ohtani
Nobuyasu Hiraoka
Application Number:
JP9058196A
Publication Date:
September 02, 2003
Filing Date:
March 18, 1996
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
B08B3/02; B05C5/00; H01L21/304; (IPC1-7): H01L21/304; B05C5/00; B08B3/02
Domestic Patent References:
| JP319216A |
Attorney, Agent or Firm:
Tsutomu Sugitani