Title:
SUBSTRATE CLEANING DEVICE
Document Type and Number:
Japanese Patent JP3818333
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To surely remove foreign matters stuck around the catching part of a substrate, to perform cleaning with high throughput and high yield and to miniaturize a device in a substrate cleaning device, capable of simultaneously cleaning both surfaces of the substrate.
SOLUTION: A substrate W is carried to a brush scrub tank in the state of being turned into an almost vertical attitude, and in the brush scrub tank, the substrate W is held in the almost vertical attitude as it is, by the catching parts 8b and 8c whose abutting part with the substrate W is turned to the same thickness of a substrate holding device 8 and is moved to a position to be abutted to rotary brushes 12a and 12b. The rotary brushes 12a and 12b are brought simultaneously into contact with both the entire front and back surfaces of the substrate W and perform scrubbing cleaning. Thus, even foreign matters which are stuck around the edge part of the surface of the substrate W are surely removed.
Inventors:
Yasuhiro Ueno
Masaaki Sato
Emiko Shinohara
Okuda Sayaka
Masaaki Sato
Emiko Shinohara
Okuda Sayaka
Application Number:
JP12924097A
Publication Date:
September 06, 2006
Filing Date:
May 20, 1997
Export Citation:
Assignee:
Lhotse Co., Ltd.
International Classes:
B08B1/04; H01L21/304; (IPC1-7): H01L21/304; B08B1/04
Domestic Patent References:
| JP7248613A | ||||
| JP8150377A | ||||
| JP9106065A |