Title:
基板乾燥方法および基板処理装置
Document Type and Number:
Japanese Patent JP6966899
Kind Code:
B2
Abstract:
A substrate drying method includes a sublimation-agent-liquid-film placing step of placing a liquid film of a liquid sublimation agent on the front surface of the substrate, a high vapor-pressure liquid supply step of supplying a high vapor-pressure liquid that has vapor pressure higher than the sublimation agent and that does not include water to a rear surface that is a surface on a side opposite to the front surface in the substrate, a vaporizing/cooling step of, after the liquid film of the sublimation agent is placed on the front surface of the substrate, stopping supplying the high vapor-pressure liquid, and, as a result, losing vaporization heat in response to vaporization of the high vapor-pressure liquid, and, as a result, cooling the sublimation agent, and, as a result, solidifying the liquid film of the sublimation agent and a sublimating step of sublimating a sublimation-agent film.
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Inventors:
Okutani Manabu
Noriyuki Kikumoto
Naohiko Yoshihara
Hirofumi Abe
Noriyuki Kikumoto
Naohiko Yoshihara
Hirofumi Abe
Application Number:
JP2017167866A
Publication Date:
November 17, 2021
Filing Date:
August 31, 2017
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/304; F26B5/00
Domestic Patent References:
| JP2010199261A | ||||
| JP2012074564A | ||||
| JP2017112220A | ||||
| JP2015142069A |
Attorney, Agent or Firm:
Patent Business Corporation Ai Patent Office