Title:
SUBSTRATE FIXTURE OF TREATING APPARATUS IN LIQUID
Document Type and Number:
Japanese Patent JPS57200300
Kind Code:
A
Abstract:
PURPOSE:To make the treatment in a liquid quick and smooth, by making a substrate fixture having the bottom, top to be in point contact with a substrate, a substrate inlet and outlet and a slip-off preventing part of the substrate rotatable by an eccentric rotating shaft. CONSTITUTION:In growing an liquid-phase epitaxial film on a substrate 5, the substrate 5 is inserted from a substrate inlet 8 of a fixture and supported by the point contact with points (A), (B) and (C) of the bottom 6. The substrate 5 in this state is then introduced into a liquid in a crucible and floated by the buoyancy of the liquid and pressed by the contact with points (A'), (B') and (C') at the top 7. A rotating and supporting shaft 4 is then rotated in a given direction in a state indicated by a virtual line, and the substrate 5 is pressed to the point (C') by the centrifugal force and buoyancy due to the eccentricity of the center (50) and the center of rotation (40) of the substrate 5 by the distance of eccentricity (e) and will not be separated from the substrate fixture. If the shaft 4 is rotated at a high speed to shake off the solvent stuck to the substrate 5, the substrate 5 is not separated from the fixture due to the fixing thereof by its own weight and the centrifugal force.
More Like This:
Inventors:
TANABE MIKIO
HIURA KAZUO
OZAWA MAKOTO
HIRATA HIDEKAZU
SAKUMA KIRIYOU
HIURA KAZUO
OZAWA MAKOTO
HIRATA HIDEKAZU
SAKUMA KIRIYOU
Application Number:
JP8483481A
Publication Date:
December 08, 1982
Filing Date:
June 01, 1981
Export Citation:
Assignee:
KOKUSAI ELECTRIC CO LTD
HITACHI LTD
HITACHI LTD
International Classes:
C30B19/06; C30B19/00; C30B35/00; H01L21/02; H01L21/208; (IPC1-7): C30B19/00; C30B35/00; H01L21/02