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Title:
SUBSTRATE HOLDER AND SUBSTRATE HOLDING METHOD
Document Type and Number:
Japanese Patent JPH09107014
Kind Code:
A
Abstract:

To provide a substrate holder capable of holding a substrate which comes into non-contact with the rear face of the substrate without contamination due to a movement, and a substrate holding method.

An elastic transformable disk 3 is fixed to an upper portion of a recessed disk 2, and a side face of a substrate (silicon wafer) 1 is pressed and held by a detent 4 placed on the disk 3. Thus, dusts are not generated as a movement mechanism is not provided, and also as contact with the substrate 1 is only a part of the side face, there is no contamination in a rear face of the substrate 1 due to dust and a heavy metal.


Inventors:
KASHIMA HIDEO
MIYATA TOSHIMITSU
KANETOMO MASABUMI
Application Number:
JP26267795A
Publication Date:
April 22, 1997
Filing Date:
October 11, 1995
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
B65G49/07; H01L21/677; H01L21/68; (IPC1-7): H01L21/68; B65G49/07
Attorney, Agent or Firm:
Toshiyuki Usuda



 
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