Title:
基板液処理方法及び基板液処理装置
Document Type and Number:
Japanese Patent JP6608515
Kind Code:
B2
Abstract:
To produce a process liquid having a predetermined pH value within a range of 5-9, and process a substrate having metal exposed with the process liquid.SOLUTION: A substrate liquid-processing method comprises: a process liquid producing step in which a process liquid including pure water, carbon dioxide and ammonia and having a predetermined pH value within a range of 5-9 is produced; and a liquid processing step in which a substrate is processed with the process liquid thus produced.SELECTED DRAWING: Figure 3
Inventors:
Jun Nonaka
Tomoyuki Sugano
Tomoyuki Sugano
Application Number:
JP2018233060A
Publication Date:
November 20, 2019
Filing Date:
December 13, 2018
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/304; B01F1/00; B01F3/04; B01F3/08; B01F5/10; B01F15/04
Domestic Patent References:
| JP2013136024A | ||||
| JP10064867A | ||||
| JP2000354729A |
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideyuki Mori
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideyuki Mori