Title:
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR PRODUCING ARTICLE
Document Type and Number:
Japanese Patent JP2023124794
Kind Code:
A
Abstract:
To dry a film on a substrate.SOLUTION: A substrate processing apparatus for drying a film on a substrate by a drying step including a first drying step for drying the film on the substrate under a pressure higher than a predetermined pressure and a second drying step for drying the film under a pressure lower than the predetermined pressure includes: a substrate holding part that holds the substrate; a chamber; a depressurization mechanism that depressurizes an interior of the chamber; a cover that has an opening and covers the substrate held by the substrate holding part inside the chamber; a first supply part that supplies gas to a first space inside the chamber and outside the cover; and a second supply part that supplies gas to a second space inside the chamber and outside the cover, wherein: the first supply part supplies the gas to the first space in the first drying step; and the second supply part supplies the gas to the second space in the second drying step.SELECTED DRAWING: Figure 1
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Inventors:
NISHIGAWARA TOMOFUMI
FUTAKI HAJIME
MURAKAMI YASUO
TERAMOTO YOJI
WAKABAYASHI SATOSHI
HAMAGUCHI KOHEI
KAYANO MICHIAKI
KISHIMOTO KATSUSHI
FUTAKI HAJIME
MURAKAMI YASUO
TERAMOTO YOJI
WAKABAYASHI SATOSHI
HAMAGUCHI KOHEI
KAYANO MICHIAKI
KISHIMOTO KATSUSHI
Application Number:
JP2022180660A
Publication Date:
September 06, 2023
Filing Date:
November 11, 2022
Export Citation:
Assignee:
CANON KK
International Classes:
F26B5/04; F26B21/12; F26B21/14
Attorney, Agent or Firm:
Takuma Abe
Sougo Kuroiwa
Sougo Kuroiwa