Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2022011581
Kind Code:
A
Abstract:
To control the ozone concentration of recovered ozone water with high accuracy.SOLUTION: A substrate processing device includes an ozone water generation unit that generates ozone water with ozone gas, a first densitometer that measures the ozone concentration of the generated ozone water, a substrate processing unit, a collection unit that collects ozone water and supplies it to the ozone water generation unit, and a control unit that controls the operation of the ozone water generation unit, the collection unit includes a temperature control unit that controls the temperature of ozone water and a second densitometer that measures the ozone concentration, and the control unit controls the supply amount of ozone gas in the ozone water generation unit on the basis of the ozone concentration measured by the second densitometer.SELECTED DRAWING: Figure 3
Inventors:
HIRASHITA TOMOMI
Application Number:
JP2020112806A
Publication Date:
January 17, 2022
Filing Date:
June 30, 2020
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/304; B08B3/02; G02F1/13
Domestic Patent References:
| JP2015155083A | 2015-08-27 | |||
| JP2011066389A | 2011-03-31 | |||
| JP2007325981A | 2007-12-20 | |||
| JP2005161284A | 2005-06-23 | |||
| JP2019155221A | 2019-09-19 | |||
| JP2019111495A | 2019-07-11 | |||
| JP2009141332A | 2009-06-25 |
Attorney, Agent or Firm:
Hidetoshi Yoshitake
Takahiro Arita
Takahiro Arita
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