Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2002347928
Kind Code:
A
Abstract:
To improve the yield of a substrate by surely preventing intrusion of particles into a process vessel.
This substrate processing device is provided with a conveyance means 3 supporting and conveying the substrate W by rollers 33-37 provided in shafts 31 and 32 which are laid between sidewalls 1 and 2 forming the process vessel S. The both ends of the shafts 31 and 32 and/or slide contact members 11-14 and 21-24 provided adjacent thereto are provided with covers 4 and water storage tanks 6 or dripping means 7 are provided as particle intrusion preventing means 4, 6, and 7 for preventing the intrusion of the particles P into the process tank S.
Inventors:
MIZUKAWA SHIGERU
NAKADA KATSUTOSHI
MATSUMOTO SHUNJI
NAKADA KATSUTOSHI
MATSUMOTO SHUNJI
Application Number:
JP2001153457A
Publication Date:
December 04, 2002
Filing Date:
May 23, 2001
Export Citation:
Assignee:
SUMITOMO PRECISION PROD CO
International Classes:
G02F1/1333; B65G49/06; B65G49/07; G03F7/30; H01L21/304; H01L21/677; H01L21/68; H01L21/683; (IPC1-7): B65G49/07; B65G49/06; G02F1/1333; G03F7/30; H01L21/304; H01L21/68
Attorney, Agent or Firm:
Satoshi Murakami
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