Title:
基板処理装置及び基板処理方法
Document Type and Number:
Japanese Patent JP6426924
Kind Code:
B2
Abstract:
In a substrate processing device 10, a magnetic field forming unit is added to a solvent supply unit 58. The magnetic field forming unit 100 applies a magnetic field to a surface of a substrate W on which a cleaning liquid and a volatile solvent coexist. The magnetic field forming unit stirs and mixes the cleaning liquid and the volatile solvent on the surface of the substrate W to promote replacement of the cleaning liquid with the volatile solvent.
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Inventors:
Yuji Nagashima
Atsushi Matsushita
Hiroki Saito
Konosuke Hayashi
Kunihiro Miyazaki
Atsushi Matsushita
Hiroki Saito
Konosuke Hayashi
Kunihiro Miyazaki
Application Number:
JP2014139197A
Publication Date:
November 21, 2018
Filing Date:
July 04, 2014
Export Citation:
Assignee:
Shibaura Mechatronics Co., Ltd.
International Classes:
H01L21/304; B01D12/00; B01F13/08; F26B5/16
Domestic Patent References:
| JP2011135009A | ||||
| JP2012200679A | ||||
| JP2003205273A |
Foreign References:
| WO2004107426A1 |
Attorney, Agent or Firm:
Shuji Shiokawa