Title:
基板処理装置
Document Type and Number:
Japanese Patent JP7378700
Kind Code:
B2
Abstract:
To provide a substrate processing apparatus capable of preventing a glass substrate from being charged, in simple configuration.SOLUTION: A substrate processing apparatus 10 comprises: a processing chamber 11 which applies predetermined processing to a glass substrate S in a vacuum atmosphere; at least one load lock chamber 12 which is capable of switching the vacuum atmosphere and an atmospheric pressure atmosphere and in which the glass substrate is accommodated; a gas supply device 30 which introduces a charging mitigation gas for mitigating charging of the glass substrate into the at least one load lock chamber; and a holder 20 which holds the glass substrate from conveyance of the glass substrate out of the load lock chamber through the application of the processing to the conveyance into the load lock chamber. After the processing is applied to the glass substrate and it is conveyed into the load lock chamber, the charging mitigation gas is introduced.SELECTED DRAWING: Figure 1
More Like This:
| JP4166902 | Vacuum processing equipment |
| WO/2019/017050 | INSPECTION SYSTEM |
| JP7266714 | Substrate carrier |
Inventors:
Gen Takahashi
Application Number:
JP2019171480A
Publication Date:
November 14, 2023
Filing Date:
September 20, 2019
Export Citation:
Assignee:
Nissin Ion Equipment Co., Ltd.
International Classes:
H01L21/677; C23C14/56; C23C16/54; H01L21/265; H05F3/04
Domestic Patent References:
| JP5051749A | ||||
| JP2019096459A | ||||
| JP2019119921A | ||||
| JP2002118161A | ||||
| JP2004241420A | ||||
| JP2003297811A | ||||
| JP2003142570A |
Previous Patent: Heat exchange system and its operating method
Next Patent: Fixing device and image forming device
Next Patent: Fixing device and image forming device