Title:
SUBSTRATE PROCESSOR
Document Type and Number:
Japanese Patent JP2004281895
Kind Code:
A
Abstract:
To provide a substrate processor which can prevent film-formation foreign matters from sticking to its shower head.
In the substrate processor, a large number of communicating holes 106 are formed in a shower head 94. Each communicating hole has a gas inlet 202 and a gas outlet 204. The aperture Φ of each gas outlet 204 is made not smaller than 0.3 mm and not larger than 2.0 mm. Also, the gas outlets 204 is formed with a pitch in the range of not smaller than 1.0 mm and not larger than 5.0 mm. Alternatively, the gas outlets 204 are formed within such a range not less than 16 pieces/cm2 and not more than 100 pieces/cm2.
Inventors:
OKADA ITARU
SUEYOSHI MAMORU
KASATSUGU KATSUNAO
SUEYOSHI MAMORU
KASATSUGU KATSUNAO
Application Number:
JP2003073891A
Publication Date:
October 07, 2004
Filing Date:
March 18, 2003
Export Citation:
Assignee:
HITACHI INT ELECTRIC INC
International Classes:
C23C16/455; H01L21/205; (IPC1-7): H01L21/205
Attorney, Agent or Firm:
Patent Business Corporation IPS