Title:
SUBSTRATE ROTATING AND DRYING DEVICE
Document Type and Number:
Japanese Patent JP3631395
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate rotating and drying device capable of reducing particles adhering to the substrate and drying the substrate under a high degree of cleanliness.
SOLUTION: This device is constructed such that a tank evacuating damper is opened after a predetermined time elapses upon closing a chamber opening or closing lid 18. In this case, in order to release the held state of a clamped substrate and a holding state of a holder 19, the tank evacuating damper is opened just after closing the chamber opening/closing lid 18, after an elapse of a period of time when air-tightness is unstable during the course of deformation of a resilient packing 14 installed to perform an air-tight closure of the chamber opening or closing lid 18 to an attitude for air-tight closure.
Inventors:
Hiroyuki Araki
Akio Yagi
Akio Yagi
Application Number:
JP19684999A
Publication Date:
March 23, 2005
Filing Date:
July 12, 1999
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
H01L21/304; F26B5/08; F26B11/14; F26B21/14; (IPC1-7): F26B11/14; F26B5/08; F26B21/14; H01L21/304
Domestic Patent References:
| JP4048622U |
Attorney, Agent or Firm:
Shigeaki Yoshida
Yoshitake Hidetoshi
Takahiro Arita
Yoshitake Hidetoshi
Takahiro Arita