Title:
基板回転装置、基板回転方法、リソグラフィ装置、および物品製造方法
Document Type and Number:
Japanese Patent JP7110005
Kind Code:
B2
Abstract:
To provide a substrate rotation device suppressing increasing a size of a substrate stage and having advantage in terms of throughput.SOLUTION: A substrate rotation device has a substrate stage 1 for holding a substrate P on a holding surface, and a drive mechanism for rotating the substrate P around an axis right to the holding surface at a state that the substrate P is floated from the substrate stage 1 by aspirating an upper surface of the substrate P.SELECTED DRAWING: Figure 1
Inventors:
Yasuhiro Mogi
Takenobu Kobayashi
Takao Miura
Takenobu Kobayashi
Takao Miura
Application Number:
JP2018116625A
Publication Date:
August 01, 2022
Filing Date:
June 20, 2018
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; H01L21/677; H01L21/683
Domestic Patent References:
| JP2013221961A | ||||
| JP2015018904A | ||||
| JP2018010247A | ||||
| JP2013219068A |
Foreign References:
| WO2013129599A1 |
Attorney, Agent or Firm:
Ryoichi Takaoka
Nao Oda
Nao Oda