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Title:
SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS
Document Type and Number:
Japanese Patent JP2013168417
Kind Code:
A
Abstract:

To provide a substrate transfer method and a substrate transfer apparatus for sufficiently transferring a heated substrate to a predetermined table without damages.

A substrate transfer method: making a work by bonding a wafer molded by molding a plurality of chips arranged in lines planarly by a resin to a support plate via a double-sided adhesive tape which has a heat-peelable adhesive layer on one side; heating, after performing intended processing on the work, the work on a first table for separating the support plate by a support plate separation device; and transferring the wafer by sucking and holding an outer peripheral part of a front face of the wafer with a suction head, after being separated from the double-sided adhesive tape, which has the resin being softened. During the transferring period, an atmospheric pressure in the suction head depending on deviation of a rear face of the wafer.


Inventors:
YAMAMOTO MASAYUKI
MURAYAMA TAKU
Application Number:
JP2012029416A
Publication Date:
August 29, 2013
Filing Date:
February 14, 2012
Export Citation:
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Assignee:
NITTO DENKO CORP
NITTO SEIKI KK
International Classes:
H01L21/677; B65G49/07
Domestic Patent References:
JP2011511449A2011-04-07
JPH1190874A1999-04-06
JP2011238870A2011-11-24
JPH10256344A1998-09-25
JP2008235836A2008-10-02
JP2003347386A2003-12-05
Attorney, Agent or Firm:
Tsutomu Sugiya
Hiroyuki Todaka