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Title:
SUBSTRATE TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2009026947
Kind Code:
A
Abstract:

To provide a substrate treatment device capable of detecting abutment between the periphery of a substrate and a brush.

The brush 13 for cleaning the periphery of the substrate can be rotated freely together with a brush rotating shaft 19 while an electromagnetic clutch 39 is turned off, and thus the brush 13 can be rotated freely following the rotation of the substrate when the brush 13 abuts on the periphery of the substrate in rotation. More specifically, when the brush 13 is rotated while the electromagnetic clutch 39 is turned off, the brush 13 abuts on the periphery of the substrate, thus detecting that the brush 13 has abutted on the periphery of the substrate based on a pulse signal outputted from an encoder 43 following the rotation of the brush rotating shaft 19.


Inventors:
KOUGAKI KOUICHI
FUJIKI HIROYUKI
NAKANO AKIYOSHI
Application Number:
JP2007188407A
Publication Date:
February 05, 2009
Filing Date:
July 19, 2007
Export Citation:
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Assignee:
DAINIPPON SCREEN MFG
International Classes:
H01L21/304; A46B13/02; H01L21/027
Domestic Patent References:
JP2003197592A2003-07-11
JPH11226521A1999-08-24
JPH08323315A1996-12-10
JP2006303149A2006-11-02
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki



 
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