スルホニウム塩、化学増幅型レジスト組成物、及びパターン形成方法

Title:

スルホニウム塩、化学増幅型レジスト組成物、及びパターン形成方法

Document Type and Number:

Japanese Patent JP5904180

Kind Code:

B2

Abstract:

A caboxylic acid sulfonium salt having formula (1) is provided wherein R0 is hydrogen or a monovalent hydrocarbon group, R01 and R02 are hydrogen or a monovalent hydrocarbon group, at least one of R0, R01 and R02 has a cyclic structure, L is a single bond or forms an ester, sulfonate, carbonate or carbamate bond with the vicinal oxygen atom, R2, R3 and R4 are monovalent hydrocarbon groups. The sulfonium salt functions as a quencher in a resist composition, enabling to form a pattern of good profile with minimal LWR, rectangularity, and high resolution.

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Inventors:

Masaki Ohashi
Fukushima
Tomohiro Kobayashi
Ryosuke Taniguchi

Application Number:

JP2013188086A

Publication Date:

April 13, 2016

Filing Date:

September 11, 2013

Export Citation:

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