Title:
硫酸エステル塩、硫酸エステル発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7240069
Kind Code:
B2
Abstract:
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).SOLUTION: There are provided a sulfate ester salt having a group represented by formula (I) and a resist composition containing the sulfate ester salt. [In the formula, Xrepresents an optionally substituted C1-72 hydrocarbon group which ay have a substituent, where -CH- contained in the hydrocarbon group may be substituted with -O-, -S-, -CO- or -SO-, provided that at least one of hydrogen atoms contained in the hydrocarbon group is substituted with a group represented by formula (IA); Zrepresents an organic cation; Rrepresents a C1-12 saturated hydrocarbon group; u1 represents an integer of 0-2 where, when u1 is 2, a plurality of R's may be the same or different from each other; s1 represents 1 or 2; t1 represents 0 or 1, provided that the sum of s1 and t1 is 1 or 2; and * represents a binding site.]SELECTED DRAWING: None
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Inventors:
Tatsuro Masuyama
Yuichi Mukai
Koji Ichikawa
Yuichi Mukai
Koji Ichikawa
Application Number:
JP2019033774A
Publication Date:
March 15, 2023
Filing Date:
February 27, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D305/06; C07C381/12; C07D327/06; C07D407/14; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2012150449A | ||||
| JP2011246439A | ||||
| JP2017095446A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP