Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7240070
Kind Code:
B2
Abstract:
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity.SOLUTION: The salt is represented by formula (I). In the formula, Q, Q, Qand Qeach represent F or a perfluoroalkyl group; R, R, Rand Reach represent H, F or a perfluoroalkyl group; z and zeach represent an integer of 0-6; Xand Xeach represent -CO-O-, -O-CO- or the like; Lrepresents an optionally substituted hydrocarbon group; one of Rand Rrepresents a hydrocarbon group having a group of formula (IA) and the other represents H or a hydrocarbon group which may have a group of formula (IA); Zand Z'each represent an organic cation; Rrepresents a saturated hydrocarbon group; u1 represents an integer of 0-2; s1 represents 1 or 2; and t1 represents 0 or 1.SELECTED DRAWING: None
More Like This:
| WO/2016/109501 | AMIDE COMPOUNDS AS TRYPTOPHAN HYDROXYLASE INHIBITORS |
| JP2015508809 | Phenyl alkanoic acid derivative as a GPR agonist |
| JP2004352622 | CURABLE COMPOSITION CONTAINING OXETANE COMPOUND |
Inventors:
Takahiro Yasue
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2019041465A
Publication Date:
March 15, 2023
Filing Date:
March 07, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D305/06; C07C381/12; C08K5/42; C08L101/02; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2019156829A | ||||
| JP2013194014A | ||||
| JP2008013551A | ||||
| JP2017095446A | ||||
| JP2011246439A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP