PURPOSE: To obtain analytical information in the depth direction of a object to be analyzed with extremely high accuracy by providing a quartz oscillation type monitor in a vacuum bell-jar and measuring the yield of sputtering by an ion gun.

CONSTITUTION: In a titled device 10, the inside of a vacuum bell-jar 1 is decompressed to prescribed pressure by an ion pump 2, after which electrons are irradiated to the surface of an object 3 to be analyzed from an electron gun 5 and the Auger electrons generated by this are captured with an energy analyzer 6 by which Auger peak intensity is measured. Next, the Ar sealed beforehand therein is turned to plasma by an ion gun 8 and this plasma is irradiated to the object 3 to cause sputtering down to prescribed depth. At this time, the secondary particles driven out from the surface of the object 3 are captured with the electrode mounted to a quartz oscillation type monitor 7, and from the amt. of deposition thereof, the yield of sputtering is detected. Thence, the Auger peak intensity at desired depth is measured in the manner similar to the above, and thereafter the similar operation is repeated.