Title:
SYSTEM AND METHOD FOR CHARGED PARTICLE BEAM EXPOSURE AND METHOD OF MANUFACTURING DEVICE
Document Type and Number:
Japanese Patent JP2002170760
Kind Code:
A
Abstract:
To provide a charged particle beam exposure system which can perform high-accuracy exposure by using a stable charged particle beam.
In this exposure system, a plurality of shield plates (diaphragms) having large openings is set up below a first projection lens 15. The opening of the upper shield plate 91 is made larger than that of the lower shield plate 93. At the central parts of the plates 91 and 93, holes 99 are provided. The holes 99 are extended in belt-like states in the polarization direction of the charged particle beam.
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Inventors:
OKINO TERUAKI
KAWADA SHINTARO
KAWADA SHINTARO
Application Number:
JP2000366846A
Publication Date:
June 14, 2002
Filing Date:
December 01, 2000
Export Citation:
Assignee:
NIKON CORP
International Classes:
G21K1/02; G03F1/20; G03F7/20; G21K5/04; H01J37/09; H01J37/305; H01J37/317; H01L21/027; (IPC1-7): H01L21/027; G03F1/16; G03F7/20; G21K1/02; G21K5/04; H01J37/09; H01J37/305
Attorney, Agent or Firm:
Watanabe temperature (1 person outside)