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Patent Searching and Data


Title:
SYSTEM AND METHOD FOR FORMING ION AND RADICAL
Document Type and Number:
Japanese Patent JP2008119687
Kind Code:
A
Abstract:

To provide a system and a method for generating electrons and ions.

In one embodiment, the system includes: an outer electrode with a discharge chamber; an inner electrode which is arranged at a position where an upper portion of the discharge chamber and a lower portion of the discharge chamber are formed inside the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber, wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.


Inventors:
STOWELL MICHAEL W
KLEMM GUENTER
HACKER VOLKER
LOTZ HANS-GEORG
Application Number:
JP2007286512A
Publication Date:
May 29, 2008
Filing Date:
November 02, 2007
Export Citation:
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Assignee:
APPLIED MATERIALS INC
International Classes:
B01J19/08; H01J37/32; H05H1/24
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yuichi Yamada
Ikeda adult