Title:
Terminal point determination of the dose amount base of low kVFIB milling in TEM procurement of a sample
Document Type and Number:
Japanese Patent JP6033180
Kind Code:
B2
Abstract:
A method, system, and computer-readable medium for forming transmission electron microscopy sample lamellae (104) using a focused ion beam including directing a high energy focused ion beam toward a bulk volume of material; milling away the unwanted volume of material to produce an unfinished sample lamella with one or more exposed faces having a damage layer; characterizing the removal rate of the focused ion beam; subsequent to characterizing the removal rate, directing a low energy focused ion beam toward the unfinished sample lamella for a predetermined milling time to deliver a specified dose of ions per area from the low energy focused ion beam; and milling the unfinished sample lamella with the low energy focused ion beam to remove at least a portion of the damage layer (402) to produce the finished sample lamella (304) including at least a portion of the feature of interest.
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Inventors:
Thomas G. Miller
Jason Aljavac
Michael Moriarty
Jason Aljavac
Michael Moriarty
Application Number:
JP2013156205A
Publication Date:
November 30, 2016
Filing Date:
July 27, 2013
Export Citation:
Assignee:
F-I-I Company
International Classes:
G01N1/28; H01J37/317
Domestic Patent References:
| JP2004361140A | ||||
| JP2003526739A | ||||
| JP2003526919A | ||||
| JP2003527629A | ||||
| JP2008520066A | ||||
| JP2012252004A |
Foreign References:
| US20030153192 | ||||
| US20050012512 |
Attorney, Agent or Firm:
Masahiko Amagai