Title:
薄膜作製装置
Document Type and Number:
Japanese Patent JP4405973
Kind Code:
B2
Abstract:
A thin film preparation apparatus performs film formation by supplying a precursor CuCl with increased supply accuracy and Cl*, from a material supply apparatus (6) outside a chamber (1) into the chamber, with the use of a member (14) to be etched, which has been temperature-controlled independently, and depositing a Cu component of the CuCl on a substrate (3), without complicating temperature control (simply by heating control by a heater), and without the influence of radiation from a plasma.
Inventors:
All prosperity
Hitoshi Sakamoto
Yu Noda
Hitoshi Sakamoto
Yu Noda
Application Number:
JP2006008230A
Publication Date:
January 27, 2010
Filing Date:
January 17, 2006
Export Citation:
Assignee:
Canon ANELVA Corporation
Yu Noda
Yu Noda
International Classes:
C23C16/14; C23C16/455
Domestic Patent References:
| JP2001295046A | ||||
| JP2003328127A | ||||
| JP2002327273A |
Attorney, Agent or Firm:
Masao Okabe
Nobuaki Kato
Okabe
Shinichi Usui
Takao Ochi
Asahi Shinmitsu
Katsumi Miyama
Toshiro Mitsuishi
Tadahiro Mitsuishi
Yasuyuki Tanaka
Hiroshi Matsumoto
Nobuaki Kato
Okabe
Shinichi Usui
Takao Ochi
Asahi Shinmitsu
Katsumi Miyama
Toshiro Mitsuishi
Tadahiro Mitsuishi
Yasuyuki Tanaka
Hiroshi Matsumoto