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Title:
THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2004149755
Kind Code:
A
Abstract:

To provide a new thiol compound, a photopolymerization initiator composition containing the thiol compound and having high sensitivity and excellent storage stability, and a photosensitive composition containing the photopolymerization initiator composition.

The photopolymerization initiator composition contains a thiol compound having a mercapto-containing group having a substituent on the carbon atom of the α-position and/or the β-position based on the mercapto group and a photopolymerization initiator. There is also provided a photosensitive composition containing the initiator composition and a new thiol compound to be used in these compositions. The photosensitive composition containing the photopolymerization initiator composition has high sensitivity and excellent storage stability and enables the reduction of cost by the improvement of the productivity.


Inventors:
KATO TAKESHI
KAMATA HIROTOSHI
OONISHI MINA
Application Number:
JP2003050608A
Publication Date:
May 27, 2004
Filing Date:
February 27, 2003
Export Citation:
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Assignee:
SHOWA DENKO KK
International Classes:
C08F2/50; (IPC1-7): C08F2/50
Attorney, Agent or Firm:
Kunihisa Landlord
Nobuhiko Ozawa
Atsushi Hayashi