PURPOSE: To provide a method for easily producing (purifying) pure water and inorganic acid of high-purity which are suitable for the manufacturing process of a semiconductor device by selecting and removing an impure metallic element contained in pure water and inorganic acid efficiently and surely.
CONSTITUTION: A method for producing high-purity acid and high-purity water is equipped with a process for applying treatment of at least either of magnetic attraction and potential difference attraction to a kind of liquid 2 to be treated which is selected from the group of inorganic acid and pure water and for selectively removing an impure metallic component contained therein and a process for vaporizing the liquid 2' to be treated in which the impure metallic component has been removed and liquefying the steam.
YOSHIDA TAKASHI
YOKOTE YUKARI
KOZUKA SHOJI
MATSUNAGA HIDEKI
