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Title:
TRI(SUBSTITUTED PHENYL)BISMUTH DERIVATIVE
Document Type and Number:
Japanese Patent JPH07112993
Kind Code:
A
Abstract:

PURPOSE: To obtain the subject derivative represented by a specified formula, and is useful as an injection preparation for X-ray contrast formation of high safety and usefulness with desirably lowered osmotic pressure and low viscosity because it has excellent contrast properties, sufficiently exhibits the development ability in water-soluble compound.

CONSTITUTION: A derivative of formula I {X1 is Y1-NR1R2 [Y1 is SO2, C=O; R1, R2 are H, a 1-4C alkyl, A-Z (A is an alkylene of 2 or more chain carbon atoms with 2 to 6 total carbon atoms; z is OR3 (R3 is SiR4R5R6 (R4 to R6 each is a 1 to 4C alkyl, phenyl), H, a 1-4C alkyl), NR7R8 (R7, R8 are H, a 1-4C alkyl))], formula II (R9 is a 1-4C alkyl), Y2-AZ [Y2 is O atom, S(O)n ((n) is 0-2)], NR1; X2, X3 are H, X1}, for example, tris(2-N,N-bis-ethylsulfamoylpenyl)bis- mucin. The reaction of a compound of formual III [M is MgX' (X' is I, Br, Cl), Li, Na) with a trihalobismuth compound of the formula: BiX3 (X is Cl, Br) gives the objective compound.


Inventors:
SUZUKI HITOMI
MAEDA KOICHI
TANIGAWA KEIZO
MIYAJI KATSUAKI
Application Number:
JP16661994A
Publication Date:
May 02, 1995
Filing Date:
July 19, 1994
Export Citation:
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Assignee:
NISSAN CHEMICAL IND LTD
International Classes:
A61K49/04; C07F9/94; (IPC1-7): C07F9/94; A61K49/04