Title:
【発明の名称】表面における分子スケールのパターン印刷方法
Document Type and Number:
Japanese Patent JP2001523039
Kind Code:
A
Abstract:
A method for mask-free molecular or atomic patterning of surfaces of reactive solids is disclosed. A molecular-scale pattern of adsorbate molecules is used in place of the conventional macroscopic "mask". Molecules adsorb at surfaces in patterns, governed by the structure of the surface, the chemical nature of the adsorbate, and the adsorbate coverage at the surface. The surface is patterned and then marked or imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid, resulting in an imprint being formed in the vicinity of the adsorbate molecules. In one aspect of the invention, photoinduced reaction of the patterned adsorbate leads to patterned photoreaction with the surface. The photoreaction can take the form of patterned photoattachment to the surface (patterned "writing" or "doping") or patterned photoremoval of atoms from the surface ("etching" which takes place in the initial reaction or through subsequent photoirradiation of the photopatterned surface). The adsorbate when irradiated with light, electrons or ions imprints a pattern on the substrate by localised reaction. The new method is exemplified by the case of a silicon substrate and chlorobenzene molecules which first adsorb in a pattern on a silicon crystal, and which when irradiated chlorinate the crystal in a similar pattern to that of the adsorbate. The method is suitable for the writing, doping or etching of molecular-scale features.
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Inventors:
Polanyi, John, Sea.
Rogers, Duncan
Rogers, Duncan
Application Number:
JP2000519809A
Publication Date:
November 20, 2001
Filing Date:
November 06, 1998
Export Citation:
Assignee:
Polanyi, John, Sea.
International Classes:
G01N13/12; G03F1/00; G03F7/00; G03F7/004; G03F7/20; H01L21/027; H01L21/205; H01L21/225; (IPC1-7): H01L21/027; G03F1/00; G03F7/20; H01L21/205
Attorney, Agent or Firm:
Yusuke Hiraki (2 outside)