PURPOSE: To provide the titled parts having a high purity dense boron nitride coating with a proper thickness good in close adhesiveness, obtained by forming the boron nitride coating to the surface of a metal material by a chemical vapor deposition method.
CONSTITUTION: The surface of a metal, a ceramic or a plastic material such as a bearing material, a high frequency insulating material, a resistor material, a crucible material, a casting die material, a rocket nozzle material or a nuclear reactor shielding structural material is coated with a boron nitride coating with a thickness 1W50μm by a chemical vapor deposition method to obtain excellent boron nitride coated parts. As the above chemical vapor deposition method, a plasma chemical vapor deposition method is pref. used and, by this method, a hexagonal film comprising a fine particle with a particle size of 0.1W5μm, an amorphous film or a mixed film thereof can be formed at a relatively low temp. of about 200W800°C in an atmosphere comprising BCl3, N2 and H2.
NAKANO MINORU
YOSHIOKA TAKESHI
| JPS5282699A | 1977-07-11 | |||
| JPS56158866A | 1981-12-07 |