MANUFACTURING APPARATUS FOR SEMICONDUCTOR CRYSTAL

Title:

MANUFACTURING APPARATUS FOR SEMICONDUCTOR CRYSTAL

Document Type and Number:

Japanese Patent JPS582290

Kind Code:

A

Abstract:

PURPOSE:To uniformly regulate a temp. distribution in a direction parallel to the interface between solid and liq. phases in a container for growing a crystal to be introduced into the core tube of a furnace and to obtain a fine single crystal by installing a heat absorbing member divisible into a plurality of parts on the wall of the core tube opposite to the container. CONSTITUTION:The core tube of a furnace is composed of inner and outer tubes 11, 12 made of quartz or the like, rectangular heat absorbing members 13A-13H having large heat capacity are installed on part of the wall, e.g., between the tubes 11, 12 in this case, and the members are lifted up and down by moving stoppers 14. When a single crystal of Hg1-xCdxTe is manufactured, a material for the crystal is packed into a quartz container 1, the container is evacuated, and one end is sealed. A heater 2 is regulated so as to provide a temp. gradient 4, the position of the furnace in the (x) direction where the temp. reaches a point M of the temp. distribution 4 corresponding to the interface between liq. and solid phases is detected beforehand, and the internal temp. of the tube 11 at the part is detected at several places in a direction perpendicular to the axis of the tube. Some of the members 13 is properly moved parallel to the axial direction of the tube 11 to make the internal temp. distribution of the tube 11 uniform in a direction perpendicular to the axis of the tube 11 at the position of the furnace in the (x) direction where the temp. reaches the point M.

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Inventors:

ITOU MICHIHARU
YOSHIKAWA MITSUO
TAKIGAWA HIROSHI

Application Number:

JP10033581A

Publication Date:

January 07, 1983

Filing Date:

June 26, 1981

Export Citation:

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Assignee:

FUJITSU LTD

International Classes:

C30B29/48; C30B11/00; H01L21/208; H01L31/0264; (IPC1-7): C30B11/00; H01L21/02; H01L21/368; H01L31/04

Attorney, Agent or Firm:

Sadaichi Igita

Next Patent: MICROWAVE INTRODUCING SYSTEM FOR MICROWAVE PLASMA PROCESSING DEVICE