Title:
WASHING TANK
Document Type and Number:
Japanese Patent JPS5848423
Kind Code:
A
Abstract:
PURPOSE:To improve wasing effect by a method wherein much water is supplied to the base supplied a washing solution and a region requiring the structure of a side wall, and the part requiring no water is constituted to be given a little water concerning a washing tank for washing a semiconductor wafer such as silicon or the like. CONSTITUTION:The drawing shows that width (x) arranging a washed wafer and the apertures of holes 6 located in the range of length (y) are enlarged and the apertures of peripheral sections 7 are narrowed so that much water may be supplied from the surface of the waferr 1. The other drawing is a sectional view showing an example of supplying deionized water from the lateral direction of a washing tank. The deionized water is fed from a suplying port 4 and passes through holes provided at a wall face 51 and is sent to the washing tank 3 and after washing the wafer 1, the deionezed water is overflowed for discharge. In this case, it may be understood that a base plate is installed in the vertical direction as the side face 51 and width (x) is provided in the height direction as shown in the drawing.
Inventors:
YAMANAKA ITARU
Application Number:
JP14767781A
Publication Date:
March 22, 1983
Filing Date:
September 17, 1981
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
B08B3/04; H01L21/00; H01L21/304; (IPC1-7): B08B3/04
Domestic Patent References:
| JPS5239322U | 1977-03-19 | |||
| JPS562245U | 1981-01-10 |
Attorney, Agent or Firm:
Shigetaka Awano (1 person outside)