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Title:
TRANSPARENT COMPOSITION COMPRISING POLYAMIDE AS BASE
Document Type and Number:
Japanese Patent JP2004315829
Kind Code:
A
Abstract:

To provide a transparent composition comprising a polyamide as a base, to provide articles composed of the composition, especially, a film to be adhered to ski, and to provide articles covered with a transparent protective layer composed of the composition and decorated with a sublimable ink.

The transparent composition (100 wt.% in total) comprises following (1) to (3). (1) 5-40 wt.% of an amorphous polyamide (B) obtained by condensing at least one diamine, which may be alicyclic, with at least one aromatic dicarboxylic acid and at least one monomer selected from an α, ω-alicyclic aminocarboxylic acid, an aliphatic dicarboxylic acid and an aliphatic diamine as an arbitrary component, (2) 0-40 wt.% of a flexible polyamide (C) selected from copolymers and copolyamides each containing a polyamide block and a polyether block and (3) 0-20 wt.% of a compatibilizer (D) for a component (A) and the component (B), wherein (C)+(D)=2-50 wt.%, (B)+(C)+(D) is >30 wt.% and the rest of 100 wt.% is a semicrystalline polyamide (A).


Inventors:
MONTANARI THIBAUT
RECOQUILLE CHRISTELLE
Application Number:
JP2004231198A
Publication Date:
November 11, 2004
Filing Date:
August 06, 2004
Export Citation:
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Assignee:
ATOFINA
International Classes:
A63C5/14; C08J5/00; C08L77/00; C08L77/02; C08L77/04; C08L77/06; C08L77/12; (IPC1-7): C08L77/06
Attorney, Agent or Firm:
Takashi Koshiba