Title:
TRANSPORTATION METHOD FOR POLYCRYSTALLINE SILICON
Document Type and Number:
Japanese Patent JP3496021
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To prevent powder generation from a packing material during transportation of polycrystalline silicon packed in resin film and also prevent contamination of the polycrystalline silicon by the powder.
SOLUTION: The polycrystalline silicon is transported with its surface being closely fitted and fixed to a packing material by vaccumizing in resin film. Rasping of the silicon with the packing material during transportation can be prevented, and thereby powder generation from the packing material is prevented.
Inventors:
Sanji Ochiai
Application Number:
JP2000265159A
Publication Date:
February 09, 2004
Filing Date:
September 01, 2000
Export Citation:
Assignee:
Sumitomo Titanium Co., Ltd.
International Classes:
B65D75/30; B65D85/86; C01B33/02; (IPC1-7): C01B33/02; B65D75/30
Domestic Patent References:
| JP7307378A | ||||
| JP11307622A | ||||
| JP63153813A | ||||
| JP7240356A | ||||
| JP9106981A | ||||
| JP10308336A |
Attorney, Agent or Firm:
Takahiko Yanagidate (2 outside)