Title:
ULTRAVIOLET LIGHT ABSORBING COMPOSITION
Document Type and Number:
Japanese Patent JP2501778
Kind Code:
B2
Abstract:
PURPOSE: To obtain an ultraviolet light absorbing composition having resistance to the deterioration of polymers against exposure to ultraviolet light by using an organic polymer and a specific amount of a specific benzotriazole ultraviolet light absorber.
CONSTITUTION: An ultraviolet light absorbing composition is formed of an organic polymer and 0.05-20 wt.% benzotriazole ultraviolet light absorbing monomer represented by the formula (wherein X is H or a halogen; R1 is H, CH3 or 4-6C t-alkyl; R2 is a straight chain or branched chain 2-10C alkylene; and R3 is H or CH3) (a copolymer or homopolymer of the ultraviolet light absorbing monomer being compounded). As the organic polymer are preferred a polyvinyl halide, a polyacrylic acid ester, a polystyrene, etc. Further, as the ultraviolet light absorber, a homopolymer of 2-(2'-hydroxy-5'- methacryloxypropyl-3'-t-butylpheyl)-5-chloro-2H-benzotriazole is preferably incorporated in an amount of 0.05-5 wt.%.
Inventors:
CHAARUZU DEBITSUDO BIAADO
NAMATSUSHIBAYA DOTSUDEI
YAMADA AKIRA
NAMATSUSHIBAYA DOTSUDEI
YAMADA AKIRA
Application Number:
JP22393894A
Publication Date:
May 29, 1996
Filing Date:
August 26, 1994
Export Citation:
Assignee:
IOLAB INC
International Classes:
C07D249/20; C08F20/00; C08F20/34; C08F20/36; C08F120/36; C08F212/00; C08F212/06; C08F220/10; C08F220/18; C08F220/36; C08K5/3472; C08K5/3475; C08L101/00; C09K3/00; G02B1/04; G02B5/22; G02C7/04; (IPC1-7): C08K5/3475; C08F20/34; C08L101/00; C09K3/00; G02B5/22
Attorney, Agent or Firm:
Heiyoshi Odashima