PURPOSE: To obtain the subject compound which has a structure represented by a specified formula and is polymerized to form a typical polymer remarkably useful as a dissolution inhibitor for a positive photoresist system.
CONSTITUTION: This compound is presented by formula I or II {(n) is 0, 1, or 2; R1 is H, a 1-10C alkyl (substituted with a halogen), phenyl (substituted with a halogen, NO2, etc.), or benzyl; R2 to R8 are each H, a halogen, a 1-10C alkyl (substituted with a halogen), phenyl (substituted with a halogen, CN, NO2, etc.), naphthyl or the like; X is O, S, or NR10 [R10 is H, a 1-6C alkyl (substituted with a halogen NO2), or phenyl]; Y is formulae III, IV, etc. [R11 is H, a 1-6C alkyl (substituted with a halogen, NO2), or phenyl]; Z is an aliphatic group containing 2 or more methylene groups (substituted with a halogen, NO2, etc.); R12 and R13 are each a 1-10C alkyl (substituted with a halogen, NO2), phenyl, or naphthyl}. The compound of formula I is obtained by reacting a compound of formula V (R1, R8, and Y are as mentioned above) with a compound of formula VI {(n) and R2 to R7 are as mentioned above), and the compound of formula II is obtained by reacting a compound of formula VII with a compound of formula VIII (R12 and R13 are as mentioned above).
HUNZIKER MAX (CH)
