Title:
シリコン破砕片の真空乾燥方法
Document Type and Number:
Japanese Patent JP6850982
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To reduce the contamination by carbon of a surface of silicon crushed pieces with the reduction in an organic gas emitted in drying from a holding member holding the silicon crushed pieces.SOLUTION: There is a provided a method for vacuum drying silicon crushed pieces that involves allowing a drying chamber to house the silicone crushed pieces held in a holding member and washed, and drying the inside of the drying chamber under reduced pressure. The holding member is a synthetic resin holding member, and the drying temperature is not higher than 50°C. The holding member is also a quartz holding member or a synthetic resin holding member with the surface of the holding member coated with silica. Then, the holding member comprises one kind or more than one kind of synthetic resins selected from the group consisting of polypropylene, polycarbonate, silicone synthetic resin, ethylene/ethylene tetrafluoride copolymer, PEEK, PTFE, PFA, FEP, and PVDF.SELECTED DRAWING: Figure 1
Inventors:
Hiroki Umehara
Ayata Teraoka
Kazuyuki Ito
Atsumi Tetsuya
Hisayuki Takesue
Ayata Teraoka
Kazuyuki Ito
Atsumi Tetsuya
Hisayuki Takesue
Application Number:
JP2016233066A
Publication Date:
March 31, 2021
Filing Date:
November 30, 2016
Export Citation:
Assignee:
Mitsubishi Materials Corporation
International Classes:
C01B33/02; F26B5/04
Domestic Patent References:
| JP2015127272A | ||||
| JP2005140536A | ||||
| JP2016056066A |
Attorney, Agent or Firm:
Masayoshi Suda
Akira Murasawa
Akira Murasawa