To prevent deterioration in processing quality of semiconductor wafers, etc. resulting from the entry of foreign bodies such as rust and particles into a device chamber.

The vacuum pump comprises a rotor shaft 7 having a spindle 22 at a shaft end part on an inlet 4 side and a rotor 8 fastened to the spindle 22 of the rotor shaft 7 with a bolt 24, and a cover 26 is attached to the rotor 8 so as to cover a fastening portion of the bolt 24. The fastening portion is prevented from being corroded by gas to be exhausted, and rust is prevented from forming at the fastening portion. In addition, foreign bodies are prevented from flowing from the inside of the cover 26 to the inlet 4 side. The cover 26 is made of a corrosion-resistant and rust-resistant material, and the surfaces of the cover 26, the rotor fastening bolt 24, and spindle 22 are coated with nickel, which is corrosion-resistant and rust-resistant.