To provide a vacuum transfer device and a vacuum processing device capable of continuous processing at a high speed.

The vacuum transfer device is provided with a vacuum transfer chamber 20 connected to a depositing chamber 30. First and second substrate retaining units 21A, 21B, constituted so as to be turned synchronously, are provided in the vacuum transfer chamber 20. The first and the second substrate retaining units 21A, 21B are provided with first and second electromagnets 212, 213 for attracting a substrate holder 11. A transfer chamber 4 connected to the vacuum transfer chamber 20 is provided with a substrate loading/unloading unit 40 for effecting the loading/unloading of the substrate 10 between the first and the second substrate retaining units 21A, 21B while the vacuum transfer chamber 20 is kept in air-tight.