To carry out alignment in high precision by preventing contact of a transparent substrate and a mask plate due to bending of a transparent substrate when making alignment of the transparent substrate and the mask plate constituting an EL panel.
The alignment of a transparent substrate 1 and a mask plate 2 is carried out by observing by a camera 5 alignment marks 1M and 2M formed at the respective corner parts, whereupon alignment is made with both alignment marks brought as close as possible in order to observe within the depth of field of the camera 5. In that case, in order to prevent contact of the transparent substrate 1 and the mask plate 2 caused by bending at the center portion of the transparent substrate 1, the transparent substrate 1 and the mask plate 2 are brought close to each other with the transparent substrate 1 bent in convex form slightly toward anti self-weight direction beforehand.
YUMIBA KENJI
MUNETO MASATOSHI
JPH11158605A | 1999-06-15 | |||
JP2001290259A | 2001-10-19 | |||
JP2003017254A | 2003-01-17 | |||
JP2004176124A | 2004-06-24 | |||
JP2004259598A | 2004-09-16 | |||
JP2005256094A | 2005-09-22 | |||
JP2002105622A | 2002-04-10 |
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