To provide a wafer carrier which is suitable for improved processing operations that provide improved device yield and low defectivity.
The wafer carrier 1 for supporting a plurality of wafers vertically includes at least first, second, and third support members 10, 12 and 14, and a plurality of slots 16 for receiving the plurality of wafers. The first, the second, and the third support members 10, 12 and 14 are provided so as to support and contact the wafers, and each slot is made up of first, second and third slot segments 18, 20 and 22, respectively, each of which respectively being extended along the first, the second and the third support members 10, 12, and 14. A cradle 2 is comprised of silicon carbide and has an oxide layer covering the silicon carbide.
HAERLE ANDREW G
CHANG HAN C
Jun Tsuruta