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Patent Searching and Data


Title:
WAFER END PART PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP3664894
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To process the end part of a wafer by a simplified device.
SOLUTION: This device is provided with a table 2 to rotate by sucking and holding a wafer 3; a unit holding member 6 provided at the upper side of the table 2; a linear shaft 11 provided movable up and down to the unit holding member 6; a pad holder 14 provided at the lower end of the linear shaft 11 through a spherical bearing 13; a ring form pad 20 fixed to the pad holder 14 corresponding to the end of the wafer 3; a cylinder 31 provided to the unit holding member 6, to press the pad holder 14, and a specific pressure to press the wafer 3 by the pad 20 is applied; and a cylinder 33 to feed a slurry on the wafer 3 at the inner side of the pad 20.


Inventors:
Muto Nei
Shinji Tsuji
Application Number:
JP31031898A
Publication Date:
June 29, 2005
Filing Date:
October 30, 1998
Export Citation:
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Assignee:
YAC Co., Ltd.
International Classes:
B24B37/00; B24B37/005; H01L21/304; (IPC1-7): B24B37/00; H01L21/304
Domestic Patent References:
JP10041259A
JP62022056U
JP7321076A
Attorney, Agent or Firm:
Yoshinori Tanabe