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Title:
WAFER TABLE FOR IMMERSION LITHOGRAPHY
Document Type and Number:
Japanese Patent JP2010232679
Kind Code:
A
Abstract:

To provide a method and apparatus that allow a liquid to be substantially contained between a lens and a wafer table assembly of an immersion lithography system.

In one embodiment of this invention, an exposure apparatus includes the lens and wafer table assembly. The wafer table assembly has a top surface, and is arranged to support a wafer to be moved with respect to the lens as well as at least one component. The top surface of the wafer and the top surface of the component are each at substantially a same height as the top surface of the wafer table assembly. An overall top surface of the wafer table assembly which includes the top surface of the wafer, the top surface of the wafer table assembly, and the top surface of the at least one component is substantially planar.


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Inventors:
HAZELTON ANDREW J
TAKAIWA HIROAKI
Application Number:
JP2010140980A
Publication Date:
October 14, 2010
Filing Date:
June 21, 2010
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G03B27/58; G03F7/20; H01L21/68; G03F
Domestic Patent References:
JPH11260686A1999-09-24
JPH10303114A1998-11-13
JPH07220990A1995-08-18
JPH06124873A1994-05-06
JPH04305917A1992-10-28
JPH10154659A1998-06-09
JPH11260686A1999-09-24
JPH10303114A1998-11-13
JPH07220990A1995-08-18
JPH06124873A1994-05-06
JPH04305917A1992-10-28
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Kazuya Nishi



 
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