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Title:
WASHING BRUSH
Document Type and Number:
Japanese Patent JP2000270929
Kind Code:
A
Abstract:

To provide a washing brush capable of washing a substrate such as a semiconductor wafer evenly.

Projections 4 each with a contact surface 5 to be in contact with a substrate are mounted at regular intervals on the outer surrounding surface of a brush body 3 to be rotated. The projections 4 are formed on the outer surrounding surface of the brush body 3 with such an interval between each other that the contact area of the projections 4 along the peripheral direction of the brush body 3 with the substrate is nearly uniform in the axial direction when the brush body 3 is rotated.


Inventors:
Sueyoshi, Hideki
Hirose, Harumichi
Application Number:
JP1999000083758
Publication Date:
October 03, 2000
Filing Date:
March 26, 1999
Export Citation:
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Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
B08B1/04; A46B7/10; A46B13/02; H01L21/304; (IPC1-7): A46B13/02; A46B7/10; B08B1/04; H01L21/304
Attorney, Agent or Firm:
鈴江 武彦 (外6名)



 
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