Title:
WASTE SOLUTION TREATMENT STRUCTURE
Document Type and Number:
Japanese Patent JP3299028
Kind Code:
B2
Abstract:
PURPOSE: To enhance the work efficiency of waste soln. treatment by making the waste soln. discharged from a treatment tank absorbed with an absorbing material and drying the absorbing material with dry air for drying a photosensitive material after processing.
CONSTITUTION: The developing soln. 13 overflowing a developing tank 12 when a developing supply soln. 43 is supplied is discharged to a waste soln. recovery part 25 through a pipeline 25. When a fixing supply soln. 44 is supplied, a fixing soln. is also recovered in the waste soln. recovery part 25 in the same way. The washing water 17 in a washing tank 16 is also recovered in the same way. Absorbing baths are received in the waste soln. recovery part 25 and the recovered waste soln. is absorbed by the baths. Dry air of a drying part 18 is introduced into the waste soln. recovery part 25 by an exhaust fan 34 through an air duct 48 to dry the waste soln. abosrbed into the baths. By this constitution, only respective dehkdrated treatment agents or the conc. waste soln. remain in the baths and the amt. thereof can be reduced.
Inventors:
Motoi Suzuki
Ryoe Nozawa
Mitsuru Katsumata
Ryoe Nozawa
Mitsuru Katsumata
Application Number:
JP7699294A
Publication Date:
July 08, 2002
Filing Date:
April 15, 1994
Export Citation:
Assignee:
Fuji Photo Film Co., Ltd.
International Classes:
G03D3/00; C02F1/04; G03D3/06; G03D15/02; (IPC1-7): C02F1/04; G03D3/00
Domestic Patent References:
| JP7163972A | ||||
| JP5245468A | ||||
| JP63166485A | ||||
| JP62201442A | ||||
| JP63121052A | ||||
| JP592199A | ||||
| JP63123490A |
Attorney, Agent or Firm:
Atsushi Nakajima (2 outside)
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